•photolithography

photolithography 发音

英：[[ˌfəʊtəlɪ'θɒgrəfɪ]]　　美：[[ˌfoʊtoʊlɪ'θɒgrəfɪ]]

英：　　美：

photolithography 中文意思翻译

photolithography 短语词组

1、photolithography lcd ─── 光刻液晶显示器

2、photolithography fem ─── 光刻有限元法

3、photolithography barc ─── 光刻机

4、photolithography chip ─── 光刻芯片

5、photolithography pbo ─── 光刻pbo

6、photolithography diy ─── 光刻diy

7、photolithography array ─── 光刻阵列

photolithography 词性/词形变化，photolithography变形

形容词: photolithographic |副词: photolithographically |

photolithography 相似词语短语

1、photolithographs ─── n.影印石版画；照相平版印刷品；vt.影印石版

2、photolithographing ─── n.影印石版画；照相平版印刷品；vt.影印石版

3、photolithographic ─── adj.光刻法的；照相平版印刷的

4、photomicrography ─── n.显微照相术；显微摄影术

5、photolithographer ─── n.影印石版画；照相平版印刷品(photolithograph的变形)

6、autolithography ─── n.直接平版印刷法

7、chromolithography ─── n.石版或锌版套色印刷术；彩色石印术

8、photolithographed ─── n.影印石版画；照相平版印刷品；vt.影印石版

9、photolithograph ─── n.影印石版画；照相平版印刷品；vt.影印石版

photolithography 常见例句（双语使用场景）

1、The develop of Fourier storage photolithography system[J]. ─── 引用该论文 浦东林,陈林森,解剑锋,沈雁.

2、Keywords Silicon;Silica;Etching rate;Photolithography; ─── 硅;二氧化硅;腐蚀速率;光刻术;

3、Let modern ultra high precision (optical resolution 5000DPI above) scanner or Photolithography can no longer reproduce maintop pattern lines can control scan. ─── 让古板超矮精度(平教不合辨率5000DPI以上)扫描仪或拍照制版也不克不及表现版纹的线条不离可以不攻扫描。

4、The most prevalent procedure is to use photolithography or electron-beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer. ─── 最常用的步骤是用光蚀刻或电子束蚀刻法，在矽晶圆表面的光阻层上制作出图案。

5、relaxed registration photolithography ─── 不严格对准光刻

6、The experiments show that the diffraction error can be eliminated with lens array photolithography method and high-quality grating can be developed. ─── 实验表明透镜阵列光刻法，可以较好的消除衍射误差，研制出高质量的光栅。

7、laser photolithography ─── 激光光刻

8、First, consider the advantages and disadvantages of photolithography. ─── 首先，想想光蚀刻法的优点跟缺点。

9、There has been a great interest in such structured films due to its potential applications in photolithography, near field microscopy and photonic devices. ─── 这种结构的金属薄膜在光印刷、近场显微镜和光子器件等方面有着广泛的应用前景，近年来引起了人们的重视。

10、BARC Process Used for Sub-micrometer Photolithography ─── BARC工艺在亚微米光刻中的应用

11、Premium Wafer - A wafer that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring. ─── 测试晶圆片-影印过程中用于颗粒计算、测量溶解度和检测金属污染的晶圆片。

12、One of the procedures used in making monolithic integrated circuits which overcomes this problem is photolithography based on photoresists. ─── 用于做克服这问题的独块巨石的集成电路的过程之一是基于光致抗蚀剂的照相平版印刷。

13、Experimental Study on Pupil Filtering Projection Photolithography ─── 光瞳滤波投影光刻实验研究

14、Implementation Methods for Wave-Front Division in Maskless Laser Interference Photolithography ─── 波前分割无掩模激光干涉光刻的实现方法

15、laser direct writing photolithography ─── 激光直写光刻

16、Design and construction of an ultrahigh vacuum evaporation equipment for atom photolithography ─── 原子光刻用超高真空蒸发设备的设计和建立

17、The Status of Photolithography Development at Huahong NEC in a Cleanroom Environment and HHNEC's View on the Process Easiness for 0.13 um, 0.09 um, and 0.065 um Gate Photolithography ─── 华虹NEC洁净室环境中的光刻技术研发现状以及华虹对0.13微米、0.09微米、和0.065微米门电路光刻难易程度的观点.

18、But because conventional photolithography becomes more difficult as the dimensions of the structures become smaller, manufacturers are exploring alternative technologies for making future nanochips. ─── 但由于结构变得更小后，传统的光蚀刻法变得更难做，因此业者正在找寻其他技术，以做出未来的奈米晶片。

19、Optical proximity correction for improving pattern quality in submicron photolithography ─── 光学邻近校正改善亚微米光刻图形质量

20、photolithography area ─── 光刻区

21、Experts think, according to the rule of physics, make more careful microprocessor technology will be at the beginning of next centuries with current photolithography technology develop acme. ─── 专家们认为,根据物理学的规律,用目前的照相平版工艺制造更精细的微处理器技术将在下世纪初发展到顶点。

22、Keywords nanotechnology;development trend;photolithography;chip; ─── 纳米技术;发展趋势;光刻印刷芯片;

23、Electron beam lithography lays down circuit patterns more slowly than photolithography does, because it generates patterns serially instead of in parallel. ─── 电子束微影制程布设电路图样时，比光刻技术慢，因为它是以循序而非平行方式产生图样。

24、One of the procedures used in making monolithic integrated circuits which overcomes this problem is photolithography based on photoresists. ─── 规程的当中一个被使用在做整体集成电路克服这个问题是石版影印根据光致抗蚀剂。

25、photolithography array ─── 光版印制阵列

26、Digital photolithography ─── 数字光刻

27、The parylene anchor with very deep semi sphere recess is fabricated utilizing the dry film photolithography technique. ─── 聚对二甲基苯固定器拥有一个非常深的半圆形沟槽，这是运用乾式薄膜光阻的技术制作而成。

28、Due to the diffracting limitation of the photolithography, imprint lithography technology, which maybe next generation lithography technology, is described. ─── 针对微纳制造中光刻环节的光衍射限制,讨论了可能成为下一代光刻技术路线的压印光刻。

29、photolithography limitation ─── 光刻极限

30、screenless photolithography ─── 无网照相平印

31、Auto-controlled Liquid Crystal Light Valve Arrays as Photolithography Shutter ─── 自控液晶光阀组式光刻快门研究

32、Research of Mask Division for Improving the Edge Sharpness of Photolithography ─── 掩模分形提高光刻边缘锐度的研究

33、Design and Development of Control Circuit of Liquid Crystal Light Valve Arrays as Photolithography Shutter ─── 液晶光阀组式光刻快门控制电路的研究与设计

34、First, consider the advantages and disadvantages of photolithography. ─── 首先，想想光蚀刻法的优点跟缺点。

35、photolithography photoetching method ─── 光刻法

36、In Fig. 3B, avidin protein was printed by photolithography onto a biotinylated PSI surface. ─── 三号乙，抗生物素蛋白印刷光刻到生物防扩散表面。

37、The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division. ─── 无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。

38、Implementation Methods for Amplitude Division Maskless Laser Interference Photolithography ─── 振幅分割无掩模激光干涉光刻的实现方法

39、The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division. ─── 摘要无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。

40、photolithography simulation ─── 光刻模拟

41、photolithography technique ─── 光刻工艺

42、Contact-mode photolithography was used for realizing the monolithic integration of 0. ─── 采用光学接触式光刻方式，实现了单片集成0。

43、Photolithography: forming electrodes in the form required on the ITO film. ─── 光刻:在ITO表面形成要求形状的电极。

44、Premium Wafer- A wafer that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring. ─── 测试晶圆片-影印过程中用于颗粒计算、量溶解度和检测金属污染的晶圆片。

45、Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. ─── 课堂讲授和实验课重点介绍了基本制程技术，如扩散、氧化、光刻、化学气相沉积等。

46、Introduction to semi-conductor 2. Manufacturing technique of wafer disc 3. Thermal process and photolithography 4. Plasma and ion implantation 5. Etching process ─── 半导体导论2.晶圆制造3.加热及微影制程4.电浆与离子布植5.蚀刻制程

47、The principle for eliminating the diffraction error of photolithography with lens array is demonstrated by optical transfer function method. ─── 用光学传递函数方法说明了透镜阵列消除光刻中衍射误差的原理。

48、Adapting rolled-carbon chicken wire to the standard photolithography and etching process that patterns and removes material to form electrical circuitry proved just as daunting. ─── 要将捲缩的碳网制作成电路，光刻和蚀刻制程已经证实是困难重重。

49、To create intricate patterns of many different types of bacteria, Weibel borrowed a technique from the computer chip industry called photolithography. ─── 为了精细地制造各种不同的细菌排列，Weibel借用了计算机芯片制造中的微影技术。

50、These multidimensional structures with nano- and micrometer features that integrate photolithography, replica molding and physical self-assembly are useful in micro- and nanofabrication. ─── 这种多尺度的复合结构将光刻技术、复制模铸和物理自组装等有效结合，广泛应用于微纳制造领域。

51、Alignment Precision - Displacement of patterns that occurs during the photolithography process. ─── 套准精度-在光刻工艺中转移图形的精度。

52、ultraviolet radiation photolithography ─── 紫外光刻

53、photolithography area dispatching ─── 光刻区调度

54、Analysis of nanometrology and atom photolithography[J]. ─── 引用该论文 张文涛,李同保.

55、Because these forms of radiation have much shorter wavelengths than the ultraviolet light currently used in photolithography, they minimize the blurring caused by diffraction. ─── 由于这类型辐射的波长远较现在光蚀刻使用的紫外光来得短，因此可以减少因绕射而造成的模糊。

56、Transmission phase gratings with continuous relief structures are fabricated with one step direct laser writing grayscale photolithography. ─── 利用一步激光直写灰阶光刻方法制作了具有连续浮雕结构的透射式相位光栅。

57、Various technical improvements have made it possible to push the limits of photolithography. ─── 各种技术若能改进，便可推进光蚀刻法的极限。

58、Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference photolithography is much simple than the traditional photolithography. ─── 模拟和实验结果表明，对点阵或孔阵图形，在同样的图形尺度下，无掩模干涉光刻比传统光刻简单得多。

59、step-and-scan photolithography ─── 步进扫描光刻机

60、Keywords Accelerator;Nucleophilic reaction;Polymer film;Photolithography; ─── 诱蚀剂;亲核反应;聚合物膜;光刻;

61、contact photolithography ─── 接触光蚀刻

62、Fabrication process of the sensor is introduced, especially the double alignment in the photolithography. ─── 分析了比较信号平均效应对两种膜型的影响。

63、that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring. ─── 测试晶圆片-影印过程中用于颗粒计算、量溶解度和检测金属污染的晶圆片。

64、projection photolithography ─── 投影光刻法

65、Why not use photolithography to make nanostructures? ─── 为什麽不使用光蚀刻法制造奈米结构？

66、single step photolithography ─── 单步光刻

67、With 300 lines of Photolithography and screen resolution, with cyberctm indosinian. ─── 如果拔取300线网屏的特技拍照制版，不离可得回有动感的印不败品了。

68、One embodiment of the present invention provides techniques and systems for determining modeling parameters for a photolithography process. ─── 一种用于为光刻工艺确定参数的方法，所述方法包括：接收布局；

69、precision photolithography ─── 精密光刻

70、A picture made by photolithography. ─── 照相平版印刷品由照相平版术制成的照片

71、Both CRTs and LCDs achieve such precision with photolithography, in which a projected light image creates a pattern for laying out a material design. ─── CRT以及LCD采用光刻技术来做到这点，这种方法利用投射的光学影像来配置材料设计的图案。

72、Application of Semiconductor Photolithography in Biochip Fabrication ─── 半导体光刻技术在生物芯片制作中的应用

73、Keywords Micro &nano-pattern;photolithography;reaction-induced phase separation; ─── 光刻;反应性相分离;微纳米图形;

74、New Filtering Approach on Partial Coherent Imaging System for Improving Photolithography Resolution ─── 部分相干分数域滤波改善光刻分辨率新方法

75、Removal of Pixel Structures by Optimizing the Parameters of Imaging System in Digital Photolithography[J]. ─── 引用该论文 郭小伟,杜惊雷,陈铭勇,杜春雷.

76、Keywords Photolithography;Digital Mask;DMD;Grayscale;Microlens;Enzyme Etching; ─── 光刻技术;数字掩模;数字微镜装置;灰度;微透镜;酶刻蚀;

77、Photoresists or anti reflective coating for photolithography process; ─── 黃光微影製程使用的光刻膠和抗反射塗層；

78、Spherical aberration can damage image quality in photolithography. ─── 球面像差能破坏光刻的成像质量。

79、In integrated circuits, the defects associated with photolithography are assumed to be the shape of circular discs in order to perform the estimation of yield and fault analysis. ─── 摘要现有成品率及关键面积估计模型中，假定缺陷轮廓为圆，而70%的实际缺陷轮廓接近于椭圆。

80、Why not use photolithography to make nano structures? ─── 为什么不使用光蚀刻法制造奈米结构？

81、Keywords nanometrology;transfer standard;atom photolithography; ─── 纳米计量;纳米传递;原子光刻;

82、Several data recording methods of WMOC ROM are experimentally explored including the laser direct writing, photolithography and mould stamping. ─── 根据模压法提出了两种波导多层只读光卡制作工艺：软刻印法和边缘粘合法。

83、How to use the measured effective diffusion length and scanner illumination condition to demonstrate photolithography line width uniformity is introduced. ─── 介绍了如何通过测量得出的等效扩散长度和光刻机的照明条件来对任何光刻工艺的线宽均匀性进行评估。

84、Photolithography shutter ─── 光刻快门

85、photolithography mask ─── 光刻版

86、Effect of distortion of mask on photolithography pattern quality ─── 畸变的掩模对光刻图形质量的影响

87、A process called photolithography defines the ion-activated regions with patterns of light and acid etching to make transistors [see illustration on page 55]. ─── 若想在晶圆上挤入更多的电晶体，就必须选择波长更短的光束。